Retracted: Texture of Thin Films of Aluminum Nitride Produced by Magnetron Sputtering

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Submitted: January 10, 2025
Published: Jan 29, 2025
DOI: 10.29328/journal.ijpra.1001106
Keywords:
Aluminum nitride films, Magnetron sputtering, Texture, Coherent scattering region size

Main Article Content

Strunin Vladimir Ivanovich
Doctor of Physics and Mathematics. Sciences, Institute of Radiophysics and Physical Electronics of the Omsk Scientific Center SB RAS, Omsk; Omsk State University named after F.M. Dostoevsky, Omsk, Russia
Baranova Larisa Vasilievna*
Ph.D. Tech. Sciences, Institute of Radiophysics and Physical Electronics of the Omsk Scientific Center SB RAS, Omsk; Omsk State University named after F.M. Dostoevsky, Omsk, Russia
Baisova Bibigul Tulegenovna
Ph.D. Physics and Mathematics Sciences, Institute of Radiophysics and Physical Electronics of the Omsk Scientific Center SB RAS, Omsk; Omsk State University named after F.M. Dostoevsky, Omsk, Russia

Abstract

The results of the study of the texture of thin films of aluminum nitride obtained by magnetron sputtering are presented. The dependence of the sizes and degree of preferential orientation of crystallites on the conditions of formation of thin films (pressure, discharge power, composition of the plasma-forming gas) is investigated.

Article Details

Ivanovich, S. V., Vasilievna, B. L., & Tulegenovna, B. B. (2025). Retracted: Texture of Thin Films of Aluminum Nitride Produced by Magnetron Sputtering. International Journal of Physics Research and Applications, 8(1), 013–016. https://doi.org/10.29328/journal.ijpra.1001106
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